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Trifluoromethane Gas

 

Trifluoromethane Gas
CHF3
UN1984
  • Trifluoromethane (CHF3) or Halocarbon 23 is a colorless, odorless, nonflammable liquefied gas that is used in plasma etching of silicon oxide or nitride layers. It may be use in combination with other halocarbons to improve etch rate and uniformity in etching.

 

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Spectra Gases' expertise extends beyond making gas mixtures for certain niche markets. We manufacture, refine and purify many gaseous raw materials...
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