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Sulfur Hexafluoride Gas

 

Sulfur Hexafluoride Gas
SF6
UN1080
  • Sulfur Hexafluoride is used as a source of fluorine or sulfur fluoride free radicals for etch processing under RF conditions, as well as a gas phase dielectric within the high power electrical and physics industries. Typical applications are for oxide etching, nitride etching, and wafer cleaning. Sulfur Hexafluoride is also used for tungsten etch, where the etch byproducts are volatile and easily transported away from the wafer surface. A higher purity Sulfur Hexafluoride results in superior process control, with less byproduct interaction and improved etch characteristics.

 

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